SUBSURFACE STRAIN IN THE GE(001) AND GE(111) SURFACES AND COMPARISON TO SILICON

被引：61

作者：

CULBERTSON, RJ ^{[1
]}

KUK, Y ^{[1
]}

FELDMAN, LC ^{[1
]}

机构：

[1] AT&T BELL LABS,MURRAY HILL,NJ 07974

来源：

SURFACE SCIENCE | 1986年 / 167卷 / 01期

关键词：

D O I：

10.1016/0039-6028(86)90789-2

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

页码：127 / 140

页数：14

共 22 条

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