CHEMICAL-REACTION AND SCHOTTKY-BARRIER FORMATION AT V/SI INTERFACES

被引：35
作者：
CLABES, JG
RUBLOFF, GW
TAN, TY
机构：
来源：
PHYSICAL REVIEW B | 1984年 / 29卷 / 04期
关键词：
D O I：
10.1103/PhysRevB.29.1540
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：1540 / 1550
页数：11
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