A PHOTOELECTRON DIFFRACTION STUDY OF THE STRUCTURE OF PF3 ADSORBED ON NI(111)

被引：86
作者：
DIPPEL, R
WEISS, KU
SCHINDLER, KM
GARDNER, P
FRITZSCHE, V
BRADSHAW, AM
ASENSIO, MC
HU, XM
WOODRUFF, DP
GONZALEZELIPE, AR
机构：
[1] UNIV WARWICK,DEPT PHYS,COVENTRY CV4 7AL,W MIDLANDS,ENGLAND
[2] MAX PLANCK GESELL,FRITZ HABER INST,W-1000 BERLIN 33,GERMANY
[3] CSIC,INST CIENCIAS MAT,SEVILLE,SPAIN
来源：
CHEMICAL PHYSICS LETTERS | 1992年 / 199卷 / 06期
关键词：
D O I：
10.1016/0009-2614(92)85021-2
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
The technique of scanned energy photoelectron diffraction has been used to study the structure PF3 adsorbed on a Ni{111} surface. The molecule adsorbs in an atop site with a Ni-P separation of 2.07 (+/- 0.03) angstrom and gives rise to an expansion of the Ni-Ni outermost layer spacing of 0.03 (+/- 0.05) angstrom.
引用
收藏
页码：625 / 630
页数：6
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