ULTRAVIOLET-LASER PHOTOABLATION OF POLYMERS - A REVIEW AND RECENT RESULTS

[1] DIRECT ETCHING OF POLYMERIC MATERIALS USING A XECL LASER [J]. APPLIED PHYSICS LETTERS, 1983, 43 (08) : 717 - 719

[2] BASTINGS D, 1987, SPRINGER P PHYSICS, V15, P410

[3] BLUM SE, 1983, Patent No. 4414059

[4] BLUM SE, 1986, Patent No. 4568632

[5] EXCIMER LASER ETCHING OF POLYIMIDE [J]. JOURNAL OF APPLIED PHYSICS, 1985, 58 (05) : 2036 - 2043

[6] LOW-TEMPERATURE UV LASER ETCHING OF PMMA - ON THE MECHANISM OF ABLATIVE PHOTODECOMPOSITION (APD) [J]. JOURNAL OF POLYMER SCIENCE PART C-POLYMER LETTERS, 1986, 24 (08) : 371 - 376

[7] Brau Ch., 1979, TOP APPL PHYS, V30, P87

[8] COLE HS, 1986, Patent No. 4617085

[9] VELOCITY DISTRIBUTION OF MOLECULAR FRAGMENTS FROM POLYMETHYLMETHACRYLATE IRRADIATED WITH UV LASER-PULSES [J]. APPLIED PHYSICS LETTERS, 1986, 48 (03) : 212 - 214

[10] TIME RESOLVED TRANSMISSION STUDIES OF POLY(METHYL METHACRYLATE) FILMS DURING ULTRAVIOLET-LASER ABLATIVE PHOTODECOMPOSITION [J]. JOURNAL OF APPLIED PHYSICS, 1987, 61 (05) : 2090 - 2092

[1] DIRECT ETCHING OF POLYMERIC MATERIALS USING A XECL LASER [J]. APPLIED PHYSICS LETTERS, 1983, 43 (08) : 717 - 719

[2] BASTINGS D, 1987, SPRINGER P PHYSICS, V15, P410

[3] BLUM SE, 1983, Patent No. 4414059

[4] BLUM SE, 1986, Patent No. 4568632

[5] EXCIMER LASER ETCHING OF POLYIMIDE [J]. JOURNAL OF APPLIED PHYSICS, 1985, 58 (05) : 2036 - 2043

[6] LOW-TEMPERATURE UV LASER ETCHING OF PMMA - ON THE MECHANISM OF ABLATIVE PHOTODECOMPOSITION (APD) [J]. JOURNAL OF POLYMER SCIENCE PART C-POLYMER LETTERS, 1986, 24 (08) : 371 - 376

[7] Brau Ch., 1979, TOP APPL PHYS, V30, P87

[8] COLE HS, 1986, Patent No. 4617085

[9] VELOCITY DISTRIBUTION OF MOLECULAR FRAGMENTS FROM POLYMETHYLMETHACRYLATE IRRADIATED WITH UV LASER-PULSES [J]. APPLIED PHYSICS LETTERS, 1986, 48 (03) : 212 - 214

[10] TIME RESOLVED TRANSMISSION STUDIES OF POLY(METHYL METHACRYLATE) FILMS DURING ULTRAVIOLET-LASER ABLATIVE PHOTODECOMPOSITION [J]. JOURNAL OF APPLIED PHYSICS, 1987, 61 (05) : 2090 - 2092