ETCHING PROFILES AT RESIST EDGES .1. MATHEMATICAL-MODELS FOR DIFFUSION-CONTROLLED CASES

被引：66
作者：
KUIKEN, HK
KELLY, JJ
NOTTEN, PHL
机构：
[1] Philips Research Lab, Eindhoven, Neth, Philips Research Lab, Eindhoven, Neth
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1986年 / 133卷 / 06期
关键词：
D O I：
10.1149/1.2108822
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
29
引用
收藏
页码：1217 / 1226
页数：10
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