REDUCTION OF THE CONCENTRATION OF SLOW INSULATOR STATES IN SIO2/INP METAL-INSULATOR SEMICONDUCTOR STRUCTURES

被引：30
作者：
KULISCH, W
KASSING, R
机构：
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1987年 / 5卷 / 02期
关键词：
D O I：
10.1116/1.583943
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
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页码：523 / 529
页数：7
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