ALIGNMENT AND REGISTRATION SCHEMES FOR PROJECTION ELECTRON LITHOGRAPHY

被引：7

作者：

FARROW, RC

BERGER, SD

GIBSON, JM

LIDDLE, JA

KRAUS, JS

CAMARDA, RM

HUGGINS, HA

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1991年 / 9卷 / 06期

关键词：

D O I：

10.1116/1.585849

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Techniques for doing alignment and registration in projection electron lithography are reviewed. The issues associated with extending these techniques to the case of high incident electron energy exposure are discussed. Measurements of backscatter electron emission contrast from W markers on Si wafers at 200 kV show that mark detection within the expected range of voltages is feasible.

引用

页码：3582 / 3585

页数：4

共 14 条

[1] 1-4 DEMAGNIFYING ELECTRON PROJECTION SYSTEM [J].

ASAI, T ;

ITO, S ;

ETO, T ;

MIGITAKA, M .

JAPANESE JOURNAL OF APPLIED PHYSICS, 1980, 19 :47-50

[2] NEW APPROACH TO PROJECTION-ELECTRON LITHOGRAPHY WITH DEMONSTRATED 0.1 MU-M LINEWIDTH [J].

BERGER, SD ;

GIBSON, JM .

APPLIED PHYSICS LETTERS, 1990, 57 (02) :153-155

[3] PROJECTION ELECTRON-BEAM LITHOGRAPHY - A NEW APPROACH [J].

BERGER, SD ;

GIBSON, JM ;

CAMARDA, RM ;

FARROW, RC ;

HUGGINS, HA ;

KRAUS, JS ;

LIDDLE, JA .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1991, 9 (06) :2996-2999

[4]

Bohlen H., 1989, Microelectronic Engineering, V9, P191, DOI 10.1016/0167-9317(89)90045-2

[5] ALIGNED MULTILAYER STRUCTURE GENERATION BY ELECTRON MICRO-PROJECTION [J].

FROSIEN, J ;

LISCHKE, B ;

ANGER, K .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (06) :1827-1829

[6]

GOLDSTEIN JI, 1981, SCANNING ELECT MICRO, pCH3

[7] ISSUES IN FABRICATING ELECTRON DEVICES WITH SUBMICROMETER DIMENSIONS [J].

HENDERSON, RC ;

MAYER, DC ;

NASH, JG .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (02) :260-268

[8] ELECTRON-PROJECTION MICROFABRICATION SYSTEM [J].

HERITAGE, MB .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (06) :1135-1145

[9] MASK FABRICATION FOR PROJECTION ELECTRON-BEAM LITHOGRAPHY INCORPORATING THE SCALPEL TECHNIQUE [J].

LIDDLE, JA ;

HUGGINS, HA ;

BERGER, SD ;

GIBSON, JM ;

WEBER, G ;

KOLA, R ;

JURGENSEN, CW .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1991, 9 (06) :3000-3004

[10]

MURATA K, 1973 ITTRI SEM, V2, P267

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