EFFECTS OF PROCESSING ON CHARACTERISTICS OF 10-15 NM THERMALLY GROWN SIO2-FILMS

被引：14
作者：
PAN, PH
SCHAEFER, C
机构：
[1] IBM, Essex Junction, VT, USA, IBM, Essex Junction, VT, USA
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1986年 / 133卷 / 06期
关键词：
D O I：
10.1149/1.2108813
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
27
引用
收藏
页码：1171 / 1176
页数：6
相关论文
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