CORE-LEVEL SHIFTS AND OXIDATION-STATES OF TA AND W - ELECTRON-SPECTROSCOPY FOR CHEMICAL-ANALYSIS APPLIED TO SURFACES

被引:103
作者
HIMPSEL, FJ [1 ]
MORAR, JF [1 ]
MCFEELY, FR [1 ]
POLLAK, RA [1 ]
HOLLINGER, G [1 ]
机构
[1] UNIV LYON 1,INST PHYS NUCL,F-69622 VILLEURBANNE,FRANCE
来源
PHYSICAL REVIEW B | 1984年 / 30卷 / 12期
关键词
D O I
10.1103/PhysRevB.30.7236
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
收藏
页码:7236 / 7241
页数:6
相关论文
共 19 条
[1]   COMBINED SIMS, AES, AND XPS INVESTIGATIONS OF TANTALUM OXIDE LAYERS [J].
BISPINCK, H ;
GANSCHOW, O ;
WIEDMANN, L ;
BENNINGHOVEN, A .
APPLIED PHYSICS, 1979, 18 (02) :113-117
[2]  
BRUNDLE CR, UNPUB
[3]  
Cotton F.A., 1972, ADV INORGANIC CHEM
[4]   AN ELLIPSOIDAL MIRROR DISPLAY ANALYZER SYSTEM FOR ELECTRON-ENERGY AND ANGULAR MEASUREMENTS [J].
EASTMAN, DE ;
DONELON, JJ ;
HIEN, NC ;
HIMPSEL, FJ .
NUCLEAR INSTRUMENTS & METHODS, 1980, 172 (1-2) :327-336
[5]   XPS STUDIES ON WO2.90 AND WO2.72 AND THE INFLUENCE OF METALLIC IMPURITIES [J].
GEHLIG, R ;
SALJE, E ;
CARLEY, AF ;
ROBERTS, MW .
JOURNAL OF SOLID STATE CHEMISTRY, 1983, 49 (03) :318-324
[6]   PROBING THE TRANSITION LAYER AT THE SIO2-SI INTERFACE USING CORE LEVEL PHOTOEMISSION [J].
HOLLINGER, G ;
HIMPSEL, FJ .
APPLIED PHYSICS LETTERS, 1984, 44 (01) :93-95
[7]   MULTIPLE-BONDING CONFIGURATIONS FOR OXYGEN ON SILICON SURFACES [J].
HOLLINGER, G ;
HIMPSEL, FJ .
PHYSICAL REVIEW B, 1983, 28 (06) :3651-3653
[8]  
HOLLINGER G, 1979, THESIS U LYON FRANCE
[9]  
Kofstad P., 1972, NONSTOICHIOMETRY DIF
[10]   CONTRIBUTION TO THE STUDY OF THE TA-O2 REACTION AT ELEVATED-TEMPERATURES AND LOW-PRESSURES .2. STUDY FOR CHEMICAL-ANALYSIS BY ELECTRON-SPECTROSCOPY [J].
LEGMA, B ;
SIMON, D ;
BAILLIF, P ;
BARDOLLE, J .
JOURNAL OF THE LESS-COMMON METALS, 1983, 95 (01) :37-46