PLASMA-ETCHING OF SPUTTERED MO AND MOSI2 THIN-FILMS IN NF3 GAS-MIXTURES

被引：30

作者：

CHOW, TP ^{[1
]}

STECKL, AJ ^{[1
]}

机构：

[1] RENSSELAER POLYTECH INST, CTR INTEGRATED ELECTR, TROY, NY 12181 USA

来源：

JOURNAL OF APPLIED PHYSICS | 1982年 / 53卷 / 08期

关键词：

D O I：

10.1063/1.331488

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：5531 / 5540

页数：10

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