INFLUENCE OF AN RF PLASMA ON THE OPTICAL AND STRUCTURAL-PROPERTIES OF VACUUM-DEPOSITED DIELECTRIC COATINGS

被引：1
作者：
HERRMANN, R
LOTZ, HG
MULLER, J
MUNZ, WD
VOGT, H
机构：
来源：
THIN SOLID FILMS | 1985年 / 127卷 / 3-4期
关键词：
D O I：
10.1016/0040-6090(85)90204-4
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：351 / 364
页数：14
相关论文
共 13 条
[1]  
ALLEN TH, 1982, P SOC PHOTO-OPT INST, V325, P93, DOI 10.1117/12.933291
[2]   DISSOCIATION OF OXYGEN IN A RADIOFREQUENCY ELECTRICAL DISCHARGE [J].
BELL, AT ;
KWONG, K .
AICHE JOURNAL, 1972, 18 (05) :990-&
[3]  
BELL AT, 1974, TECHNIQUES APPLICATI, P26
[4]  
CHRISTMAS TM, 1977, OPT LASER TECHNOL, P109
[5]  
EBERT J, 1982, P SOC PHOTO-OPT INST, V325, P29, DOI 10.1117/12.933283
[6]   REACTIVE EVAPORATION IN IONIZED GASES [J].
HEITMANN, W .
APPLIED OPTICS, 1971, 10 (11) :2414-&
[7]   CATALYTIC EFFECTS IN THE DISSOCIATION OF OXYGEN IN MICROWAVE DISCHARGES [J].
KAUFMAN, F ;
KELSO, JR .
JOURNAL OF CHEMICAL PHYSICS, 1960, 32 (01) :301-302
[8]  
KAUSCHE H, 1965, Patent No. 1515311
[9]   THIN-FILM FORMATION OF IN2O3, TIN, AND TAN BY RF REACTIVE ION PLATING [J].
MURAYAMA, Y .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (04) :818-820
[10]  
NETTERFIELD R, 1983, APPL OPT, V22, P178
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