LOW-ENERGY ION IRRADIATION DURING FILM GROWTH FOR REDUCING DEFECT DENSITIES IN EPITAXIAL TIN(100) FILMS DEPOSITED BY REACTIVE-MAGNETRON SPUTTERING

被引：101
作者：
HULTMAN, L
HELMERSSON, U
BARNETT, SA
SUNDGREN, JE
GREENE, JE
机构：
[1] UNIV ILLINOIS,DEPT MAT SCI,URBANA,IL 61801
[2] UNIV ILLINOIS,COORDINATED SCI LAB,URBANA,IL 61801
[3] UNIV ILLINOIS,MAT RES LAB,URBANA,IL 61801
来源：
JOURNAL OF APPLIED PHYSICS | 1987年 / 61卷 / 02期
关键词：
D O I：
10.1063/1.338257
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：552 / 555
页数：4
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