RIDGE TYPE MICROFABRICATION BY MASKLESS ION-IMPLANTATION OF SI INTO SIO2 FILM

被引：1

作者：

SHIOKAWA, T

MIYAMOTO, I

KIM, PH

OCHIAI, Y

MASUYAMA, A

TOYODA, K

NAMBA, S

机构：

[1] TOYO UNIV,FAC ENGN,KAWAGOE,SAITAMA 350,JAPAN

[2] OSAKA UNIV,FAC ENGN SCI,TOYONAKA,OSAKA 560,JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 1985年 / 24卷 / 11期

关键词：

D O I：

10.1143/JJAP.24.L870

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：L870 / L872

页数：3

共 11 条

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[10] 100 KEV FOCUSED ION-BEAM SYSTEM WITH A EXB MASS FILTER FOR MASKLESS ION-IMPLANTATION [J].

SHIOKAWA, T ;

KIM, PH ;

TOYODA, K ;

NAMBA, S ;

MATSUI, T ;

GAMO, K .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1983, 1 (04) :1117-1120

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