FLATNESS, CONTRAST, AND RESOLUTION CONSIDERATIONS OF CATHODE PROJECTION MICROFABRICATION SYSTEMS

[1] DENHARTOG JP, 1952, ADV STRENGTH MATERIA

[2] Fay B., 1973, Optics Communications, V9, P424, DOI 10.1016/0030-4018(73)90287-3

[3] FAY B, 1974, 6TH INT C EL ION BEA, V1, P527

[4] EXPOSURE MODEL FOR ELECTRON-SENSITIVE RESISTS [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1974, ED21 (05) : 286 - 299

[5] SOLUBILITY RATE OF POLY-(METHYL METHACRYLATE), PMMA, ELECTRON-RESIST [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1974, 121 (12) : 1669 - 1671

[6] ENERGY DISSIPATION IN A THIN POLYMER FILM BY ELECTRON-BEAM SCATTERING [J]. JOURNAL OF APPLIED PHYSICS, 1974, 45 (06) : 2551 - 2566

[7] KYSER DF, 1974, 6TH INT C EL ION BEA, V1, P205

[8] ELECTRON IMAGE PROJECTION SYSTEMS FOR MICROCIRCUIT LITHOGRAPHY [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1972, ED19 (05) : 647 - &

[9] LSI PATTERN GENERATION AND REPLICATION BY ELECTRON-BEAMS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1973, 10 (06): : 1025 - 1027

[10] MARGENAU H, 1962, MATHEMATICS PHYSICS

[1] DENHARTOG JP, 1952, ADV STRENGTH MATERIA

[2] Fay B., 1973, Optics Communications, V9, P424, DOI 10.1016/0030-4018(73)90287-3

[3] FAY B, 1974, 6TH INT C EL ION BEA, V1, P527

[4] EXPOSURE MODEL FOR ELECTRON-SENSITIVE RESISTS [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1974, ED21 (05) : 286 - 299

[5] SOLUBILITY RATE OF POLY-(METHYL METHACRYLATE), PMMA, ELECTRON-RESIST [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1974, 121 (12) : 1669 - 1671

[6] ENERGY DISSIPATION IN A THIN POLYMER FILM BY ELECTRON-BEAM SCATTERING [J]. JOURNAL OF APPLIED PHYSICS, 1974, 45 (06) : 2551 - 2566

[7] KYSER DF, 1974, 6TH INT C EL ION BEA, V1, P205

[8] ELECTRON IMAGE PROJECTION SYSTEMS FOR MICROCIRCUIT LITHOGRAPHY [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1972, ED19 (05) : 647 - &

[9] LSI PATTERN GENERATION AND REPLICATION BY ELECTRON-BEAMS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1973, 10 (06): : 1025 - 1027

[10] MARGENAU H, 1962, MATHEMATICS PHYSICS