OXIDATION INDUCED STRESSES AND SOME EFFECTS ON THE BEHAVIOR OF OXIDE-FILMS

被引：116

作者：

HSUEH, CH ^{[1
]}

EVANS, AG ^{[1
]}

机构：

[1] UNIV CALIF BERKELEY, DEPT MAT SCI & MINERAL ENGN, BERKELEY, CA 94720 USA

来源：

JOURNAL OF APPLIED PHYSICS | 1983年 / 54卷 / 11期

关键词：

D O I：

10.1063/1.331854

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：6672 / 6686

页数：15

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