IDENTIFICATION OF DOMINANT DIFFUSING SPECIES IN SILICIDE FORMATION

被引：104

作者：

CHU, WK

KRAUTLE, H

MAYER, JW

MULLER, H

NICOLET, MA

TU, KN

机构：

[1] CALTECH,PASADENA,CA 91109

[2] IBM,THOMAS J WATSON RES CTR,YORKTOWN HEIGHTS,NY 10598

来源：

APPLIED PHYSICS LETTERS | 1974年 / 25卷 / 08期

关键词：

D O I：

10.1063/1.1655546

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：454 / 457

页数：4

共 11 条

[1] GROWTH KINETICS OBSERVED IN FORMATION OF METAL SILICIDES ON SILICON [J].

BOWER, RW ;

MAYER, JW .

APPLIED PHYSICS LETTERS, 1972, 20 (09) :359-&

[2] USE OF RUTHERFORD BACKSCATTERING TO STUDY BEHAVIOR OF ION-IMPLANTED ATOMS DURING ANODIC-OXIDATION OF ALUMINUM - AR, KR, XE, K, RB, CS, CL, BR, AND I [J].

BROWN, F ;

MACKINTOSH, WD .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1973, 120 (08) :1096-1102

[3]

CHU WK, 1974, B AM PHYS SOC, V19, P273

[4]

HUCHINS GA, 1973, THIN SOLID FILMS, V18, P343

[5] ANALYSIS OF FORMATION OF HAFNIUM SILICIDE ON SILICON [J].

KIRCHER, CJ ;

MAYER, JW ;

TU, KN ;

ZIEGLER, JF .

APPLIED PHYSICS LETTERS, 1973, 22 (02) :81-83

[6]

Kirkendall EO, 1942, T AM I MIN MET ENG, V147, P104

[7] ANALYSIS OF THIN-FILM STRUCTURES WITH NUCLEAR BACKSCATTERING AND X-RAY-DIFFRACTION [J].

MAYER, JW ;

TU, KN .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1974, 11 (01) :86-93

[8] KINETICS AND MECHANISM OF PLATINUM SILICIDE FORMATION ON SILICON [J].

POATE, JM ;

TISONE, TC .

APPLIED PHYSICS LETTERS, 1974, 24 (08) :391-393

[9] FORMATION OF VANADIUM SILICIDES BY INTERACTIONS OF V WITH BARE AND OXIDIZED SI WAFERS [J].

TU, KN ;

ZIEGLER, JF ;

KIRCHER, CJ .

APPLIED PHYSICS LETTERS, 1973, 23 (09) :493-495

[10]

TU KN, TO BE PUBLISHED

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