GROWTH OF HIGH-PURITY GAAS-LAYERS BY MOLECULAR-BEAM EPITAXY

被引:52
作者
HWANG, JCM
TEMKIN, H
BRENNAN, TM
FRAHM, RE
机构
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D O I
10.1063/1.93727
中图分类号
O59 [应用物理学];
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页码:66 / 68
页数:3
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