LASER CHEMICAL VAPOR-DEPOSITION OF GOLD .2.

被引：61

作者：

BAUM, TH ^{[1
]}

JONES, CR ^{[1
]}

机构：

[1] IBM CORP,DIV GEN TECHNOL,ENDICOTT,NY 13760

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1986年 / 4卷 / 05期

关键词：

D O I：

10.1116/1.583481

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：1187 / 1191

页数：5

共 11 条

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BAUM, TH ;

JONES, CR .

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[6]

EHRLICH DJ, 1983, J VAC SCI TECHNOL B, V1, P969, DOI 10.1116/1.582718

[7] LASER CHEMICAL VAPOR-DEPOSITION OF COPPER [J].

HOULE, FA ;

JONES, CR ;

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APPLIED PHYSICS LETTERS, 1985, 46 (02) :204-206

[8]

KLASSEN RA, UNPUB

[9]

Maissel L.I., 1970, HDB THIN FILM TECHNO, P13

[10] LCVD OF COPPER - DEPOSITION RATES AND DEPOSIT SHAPES [J].

MOYLAN, CR ;

BAUM, TH ;

JONES, CR .

APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1986, 40 (01) :1-5

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