BAKEABLE DUOPLASMATRON ION GUN FOR SIMS MICROANALYSIS

被引：8

作者：

KONARSKI, P

KALCZUK, M

KOSCINSKI, J

机构：

[1] Research and Development Centre of Vacuum Electronics (OBREP), PL-00-241 Warszawa

来源：

REVIEW OF SCIENTIFIC INSTRUMENTS | 1992年 / 63卷 / 04期

关键词：

D O I：

10.1063/1.1142941

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

A 10-keV duoplasmatron ion gun with ion optical column is presented. The system is fully bakeable; copper gaskets and alumina isolators are used. The source can operate with hot filament or hollow cathode. The differentially pumped ion optical column consists of a set of three lenses, double octupole stigmator, deflection-scanning system, and diaphragm set.

引用

页码：2397 / 2399

页数：3

共 6 条

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VACUUM, 1984, 34 (1-2) :51-61

[2]

Harting E., 1976, ELECTROSTATIC LENSES

[3] SCANNING MICROBEAM USING A LIQUID-METAL ION-SOURCE [J].

ISHITANI, T ;

TAMURA, H ;

TODOKORO, H .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1982, 20 (01) :80-83

[4] THEORETICAL AND EXPERIMENTAL STUDY OF DUOPLASMATRON ION-SOURCE .1. MODEL OF DUOPLASMATRON DISCHARGE [J].

LEJEUNE, C .

NUCLEAR INSTRUMENTS & METHODS, 1974, 116 (03) :417-428

[5]

MARKOWSKI G, 1985, THESIS ITE POLITECHN

[6]

PRAJZNER A, 1978, THESIS ITE POLITECHN

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