EFFECTS OF ELLIPSOMETRIC PARAMETERS CAUSED BY HEAT-TREATMENT OF SILICON (111) SURFACE

被引：22

作者：

KONO, S ^{[1
]}

HANEKAMP, LJ ^{[1
]}

VANSILFHOUT, A ^{[1
]}

机构：

[1] TWENTE UNIV TECHNOL,DEPT APPL PHYS,ENSCHEDE,NETHERLANDS

来源：

SURFACE SCIENCE | 1977年 / 65卷 / 02期

关键词：

D O I：

10.1016/0039-6028(77)90471-X

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

页码：633 / 640

页数：8

共 11 条

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