EXCIMER LASER-INDUCED CHEMICAL VAPOR-DEPOSITION OF TITANIUM SILICIDE

被引：17

作者：

GUPTA, A ^{[1
]}

WEST, GA ^{[1
]}

BEESON, KW ^{[1
]}

机构：

[1] ALLIED CORP,CORP TECHNOL,MORRISTOWN,NJ 07960

来源：

JOURNAL OF APPLIED PHYSICS | 1985年 / 58卷 / 09期

关键词：

D O I：

10.1063/1.335733

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：3573 / 3582

页数：10

共 22 条

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[3]

BRORS DL, 1983, SOLID STATE TECHNOL, V26, P183

[4]

Clark R. J. H., 1968, CHEM TITANIUM VANADI

[5] REACTIONS OF SILANES WITH HALOGENS - CHEMILUMINESCENT PRODUCTS IN ULTRAVIOLET-VISIBLE SPECTRUM [J].

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GOLE, JL .

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[6] COMPARISON OF LASER-INITIATED AND THERMAL CHEMICAL VAPOR-DEPOSITION OF TUNGSTEN FILMS [J].

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RATHMAN, DD .

APPLIED PHYSICS LETTERS, 1984, 45 (06) :623-625

[7]

DEUTSCH TF, 1984, P MRS S LASER CONTRO, V29, P67

[8]

EMERY K, 1984, P SOC PHOTO-OPT INST, V459, P9, DOI 10.1117/12.939428

[9]

HEIBER K, 1984, 9TH P INT C CVD EL S, P205

[10] PROPERTIES OF MOLYBDENUM SILICIDE FILM DEPOSITED BY CHEMICAL VAPOR-DEPOSITION [J].

INOUE, S ;

TOYOKURA, N ;

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TAKAGI, M .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1983, 130 (07) :1603-1607

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