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P-N-JUNCTION FORMATION USING LASER-INDUCED DONORS IN SILICON
被引:32
作者
:
MADA, Y
论文数:
0
引用数:
0
h-index:
0
MADA, Y
INOUE, N
论文数:
0
引用数:
0
h-index:
0
INOUE, N
机构
:
来源
:
APPLIED PHYSICS LETTERS
|
1986年
/ 48卷
/ 18期
关键词
:
D O I
:
10.1063/1.96982
中图分类号
:
O59 [应用物理学];
学科分类号
:
摘要
:
引用
收藏
页码:1205 / 1207
页数:3
相关论文
共 6 条
[1]
CONVERSION OF THE CONDUCTIVITY MODE IN SILICON BY OXYGEN ION-IMPLANTATION AND ITS APPLICATION IN A NOVEL DIELECTRIC ISOLATION TECHNIQUE
CHI, JY
论文数:
0
引用数:
0
h-index:
0
机构:
MIT,DEPT MAT SCI & ENGN,CAMBRIDGE,MA 02139
MIT,DEPT MAT SCI & ENGN,CAMBRIDGE,MA 02139
CHI, JY
HOLMSTROM, RP
论文数:
0
引用数:
0
h-index:
0
机构:
MIT,DEPT MAT SCI & ENGN,CAMBRIDGE,MA 02139
MIT,DEPT MAT SCI & ENGN,CAMBRIDGE,MA 02139
HOLMSTROM, RP
MAO, BY
论文数:
0
引用数:
0
h-index:
0
机构:
MIT,DEPT MAT SCI & ENGN,CAMBRIDGE,MA 02139
MIT,DEPT MAT SCI & ENGN,CAMBRIDGE,MA 02139
MAO, BY
[J].
APPLIED PHYSICS LETTERS,
1982,
40
(05)
: 420
-
422
[2]
A MULTIPLE P-N-JUNCTION STRUCTURE OBTAINED FROM AS-GROWN CZOCHRALSKI SILICON-CRYSTALS BY HEAT-TREATMENT - APPLICATION TO SOLAR-CELLS
CHI, JY
论文数:
0
引用数:
0
h-index:
0
CHI, JY
GATOS, HC
论文数:
0
引用数:
0
h-index:
0
GATOS, HC
MAO, BY
论文数:
0
引用数:
0
h-index:
0
MAO, BY
[J].
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1980,
27
(07)
: 1306
-
1309
[3]
EFFECT OF HEAT TREATMENT UPON THE ELECTRICAL PROPERTIES OF SILICON CRYSTALS
FULLER, CS
论文数:
0
引用数:
0
h-index:
0
FULLER, CS
LOGAN, RA
论文数:
0
引用数:
0
h-index:
0
LOGAN, RA
[J].
JOURNAL OF APPLIED PHYSICS,
1957,
28
(12)
: 1427
-
1436
[4]
INCORPORATION OF OXYGEN INTO SILICON DURING PULSED-LASER IRRADIATION
HOH, K
论文数:
0
引用数:
0
h-index:
0
机构:
VLSI TECHNOL RES ASSOC,COOPERAT LABS,TAKATSU KU,KAWASAKI 213,JAPAN
VLSI TECHNOL RES ASSOC,COOPERAT LABS,TAKATSU KU,KAWASAKI 213,JAPAN
HOH, K
KOYAMA, H
论文数:
0
引用数:
0
h-index:
0
机构:
VLSI TECHNOL RES ASSOC,COOPERAT LABS,TAKATSU KU,KAWASAKI 213,JAPAN
VLSI TECHNOL RES ASSOC,COOPERAT LABS,TAKATSU KU,KAWASAKI 213,JAPAN
KOYAMA, H
UDA, K
论文数:
0
引用数:
0
h-index:
0
机构:
VLSI TECHNOL RES ASSOC,COOPERAT LABS,TAKATSU KU,KAWASAKI 213,JAPAN
VLSI TECHNOL RES ASSOC,COOPERAT LABS,TAKATSU KU,KAWASAKI 213,JAPAN
UDA, K
MIURA, Y
论文数:
0
引用数:
0
h-index:
0
机构:
VLSI TECHNOL RES ASSOC,COOPERAT LABS,TAKATSU KU,KAWASAKI 213,JAPAN
VLSI TECHNOL RES ASSOC,COOPERAT LABS,TAKATSU KU,KAWASAKI 213,JAPAN
MIURA, Y
[J].
JAPANESE JOURNAL OF APPLIED PHYSICS,
1980,
19
(07)
: L375
-
L378
[5]
OXYGEN CONTENT OF SILICON SINGLE CRYSTALS
KAISER, W
论文数:
0
引用数:
0
h-index:
0
KAISER, W
KECK, PH
论文数:
0
引用数:
0
h-index:
0
KECK, PH
[J].
JOURNAL OF APPLIED PHYSICS,
1957,
28
(08)
: 882
-
887
[6]
SZE SM, 1969, PHYSICS SEMICONDUCTO, P120
←
1
→
共 6 条
[1]
CONVERSION OF THE CONDUCTIVITY MODE IN SILICON BY OXYGEN ION-IMPLANTATION AND ITS APPLICATION IN A NOVEL DIELECTRIC ISOLATION TECHNIQUE
CHI, JY
论文数:
0
引用数:
0
h-index:
0
机构:
MIT,DEPT MAT SCI & ENGN,CAMBRIDGE,MA 02139
MIT,DEPT MAT SCI & ENGN,CAMBRIDGE,MA 02139
CHI, JY
HOLMSTROM, RP
论文数:
0
引用数:
0
h-index:
0
机构:
MIT,DEPT MAT SCI & ENGN,CAMBRIDGE,MA 02139
MIT,DEPT MAT SCI & ENGN,CAMBRIDGE,MA 02139
HOLMSTROM, RP
MAO, BY
论文数:
0
引用数:
0
h-index:
0
机构:
MIT,DEPT MAT SCI & ENGN,CAMBRIDGE,MA 02139
MIT,DEPT MAT SCI & ENGN,CAMBRIDGE,MA 02139
MAO, BY
[J].
APPLIED PHYSICS LETTERS,
1982,
40
(05)
: 420
-
422
[2]
A MULTIPLE P-N-JUNCTION STRUCTURE OBTAINED FROM AS-GROWN CZOCHRALSKI SILICON-CRYSTALS BY HEAT-TREATMENT - APPLICATION TO SOLAR-CELLS
CHI, JY
论文数:
0
引用数:
0
h-index:
0
CHI, JY
GATOS, HC
论文数:
0
引用数:
0
h-index:
0
GATOS, HC
MAO, BY
论文数:
0
引用数:
0
h-index:
0
MAO, BY
[J].
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1980,
27
(07)
: 1306
-
1309
[3]
EFFECT OF HEAT TREATMENT UPON THE ELECTRICAL PROPERTIES OF SILICON CRYSTALS
FULLER, CS
论文数:
0
引用数:
0
h-index:
0
FULLER, CS
LOGAN, RA
论文数:
0
引用数:
0
h-index:
0
LOGAN, RA
[J].
JOURNAL OF APPLIED PHYSICS,
1957,
28
(12)
: 1427
-
1436
[4]
INCORPORATION OF OXYGEN INTO SILICON DURING PULSED-LASER IRRADIATION
HOH, K
论文数:
0
引用数:
0
h-index:
0
机构:
VLSI TECHNOL RES ASSOC,COOPERAT LABS,TAKATSU KU,KAWASAKI 213,JAPAN
VLSI TECHNOL RES ASSOC,COOPERAT LABS,TAKATSU KU,KAWASAKI 213,JAPAN
HOH, K
KOYAMA, H
论文数:
0
引用数:
0
h-index:
0
机构:
VLSI TECHNOL RES ASSOC,COOPERAT LABS,TAKATSU KU,KAWASAKI 213,JAPAN
VLSI TECHNOL RES ASSOC,COOPERAT LABS,TAKATSU KU,KAWASAKI 213,JAPAN
KOYAMA, H
UDA, K
论文数:
0
引用数:
0
h-index:
0
机构:
VLSI TECHNOL RES ASSOC,COOPERAT LABS,TAKATSU KU,KAWASAKI 213,JAPAN
VLSI TECHNOL RES ASSOC,COOPERAT LABS,TAKATSU KU,KAWASAKI 213,JAPAN
UDA, K
MIURA, Y
论文数:
0
引用数:
0
h-index:
0
机构:
VLSI TECHNOL RES ASSOC,COOPERAT LABS,TAKATSU KU,KAWASAKI 213,JAPAN
VLSI TECHNOL RES ASSOC,COOPERAT LABS,TAKATSU KU,KAWASAKI 213,JAPAN
MIURA, Y
[J].
JAPANESE JOURNAL OF APPLIED PHYSICS,
1980,
19
(07)
: L375
-
L378
[5]
OXYGEN CONTENT OF SILICON SINGLE CRYSTALS
KAISER, W
论文数:
0
引用数:
0
h-index:
0
KAISER, W
KECK, PH
论文数:
0
引用数:
0
h-index:
0
KECK, PH
[J].
JOURNAL OF APPLIED PHYSICS,
1957,
28
(08)
: 882
-
887
[6]
SZE SM, 1969, PHYSICS SEMICONDUCTO, P120
←
1
→