SECONDARY-ELECTRON EMISSION FROM A HYDROGEN-IMPLANTED GRAPHITE BY LOW-ENERGY ELECTRON-IMPACT

被引：6

作者：

OHYA, K

NISHIMURA, K

MORI, I

机构：

[1] The University of Tokushima, Tokushima

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1991年 / 30卷 / 05期

关键词：

SECONDARY ELECTRON EMISSION; HYDROGEN-PLASMA-EXPOSED GRAPHITE; CARBONIZATION; PLASMA-SURFACE INTERACTION; MONTE-CARLO SIMULATION; BACKSCATTERING ELECTRON; ANGLE OF INCIDENCE;

D O I：

10.1143/JJAP.30.1093

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

For a plasma-surface interaction, the influence of an implantation of hydrogen atoms on the secondary electron emission of graphite bombarded by low-energy (< 500 eV) electrons is investigated by using a Monte Carlo simulation. The results show that the secondary electron yield increases and the backscattering yield decreases; the incident-angle dependence of the former is little enhanced and the dependence of the latter is largely enhanced.

引用

页码：1093 / 1094

页数：2

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