INFLUENCE OF GROWTH-CONDITIONS ON UNDOPED AND SULFUR-DOPED INP GROWN BY MOLECULAR-BEAM EPITAXY

被引:11
作者
ILIADIS, A [1 ]
PRIOR, KA [1 ]
STANLEY, CR [1 ]
MARTIN, T [1 ]
DAVIES, GJ [1 ]
机构
[1] BRITISH TELECOM RES LABS,IPSWICH IP5 7RE,SUFFOLK,ENGLAND
关键词
D O I
10.1063/1.337684
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:213 / 218
页数:6
相关论文
共 21 条
[1]  
ALLSOP DWE, 1985, SEP EUR SOL STAT DEV
[2]   THE INFLUENCE OF GROWTH-CONDITIONS ON SULFUR INCORPORATION IN GAAS GROWN BY MOLECULAR-BEAM EPITAXY [J].
ANDREWS, DA ;
HECKINGBOTTOM, R ;
DAVIES, GJ .
JOURNAL OF APPLIED PHYSICS, 1983, 54 (08) :4421-4425
[3]   THE INFLUENCE OF GROWTH-CONDITIONS ON SELENIUM INCORPORATION IN GAAS GROWN BY MOLECULAR-BEAM EPITAXY [J].
ANDREWS, DA ;
KONG, MY ;
HECKINGBOTTOM, R ;
DAVIES, GJ .
JOURNAL OF APPLIED PHYSICS, 1984, 55 (04) :841-845
[4]   MOLECULAR-BEAM EPITAXIAL-GROWTH OF UNIFORM IN0.53GA0.47AS ON INP WITH A COAXIAL IN-GA OVEN [J].
CHENG, KY ;
CHO, AY ;
WAGNER, WR ;
BONNER, WA .
JOURNAL OF APPLIED PHYSICS, 1981, 52 (02) :1015-1021
[5]   ELECTROCHEMICAL SULFUR DOPING OF GAAS GROWN BY MOLECULAR-BEAM EPITAXY [J].
DAVIES, GJ ;
ANDREWS, DA ;
HECKINGBOTTOM, R .
JOURNAL OF APPLIED PHYSICS, 1981, 52 (12) :7214-7218
[6]   EVAPORATION OF INP UNDER KNUDSEN (EQUILIBRIUM) AND LANGMUIR (FREE) EVAPORATION CONDITIONS [J].
FARROW, RFC .
JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1974, 7 (17) :2436-2448
[7]   COMPOSITION EFFECTS IN THE GROWTH OF GA(IN)ASYP1-Y ALLOYS BY MBE [J].
FOXON, CT ;
JOYCE, BA ;
NORRIS, MT .
JOURNAL OF CRYSTAL GROWTH, 1980, 49 (01) :132-140
[8]   EFFECT OF INP SUBSTRATE THERMAL-DEGRADATION ON MBE INGAAS LAYERS [J].
GENOVA, F ;
PAPUZZA, C ;
RIGO, C ;
STANO, S .
JOURNAL OF CRYSTAL GROWTH, 1984, 69 (2-3) :635-638
[9]   GERMANIUM DOPING OF GALLIUM-ARSENIDE GROWN BY MOLECULAR-BEAM EPITAXY SOME THERMODYNAMIC ASPECTS [J].
HECKINGBOTTOM, R ;
DAVIES, GJ .
JOURNAL OF CRYSTAL GROWTH, 1980, 50 (03) :644-647
[10]   SOLUBILITY AND POINT DEFECT DOPANT INTERACTIONS IN GAAS .1. TELLURIUM DOPING [J].
HURLE, DTJ .
JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS, 1979, 40 (08) :627-637