EFFECT OF HYDROGEN ON THE PROPERTIES OF MAGNETRON SPUTTERING OF HYDROGENATED AMORPHOUS-SILICON CARBON ALLOY-FILMS

被引：5

作者：

SAITO, N

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1987年 / 61卷 / 08期

关键词：

D O I：

10.1063/1.337844

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：2962 / 2965

页数：4

共 10 条

[1]

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[10] EFFECT OF HYDROGEN ON THE DEPOSITION RATE FOR PLANAR RF MAGNETRON SPUTTERING OF HYDROGENATED AMORPHOUS-SILICON [J].

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