共 12 条
- [1] MEASUREMENT OF NEGATIVE-IONS BY PHOTODETACHMENT WITH YAG LASER IN DISCHARGE PLASMAS [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1990, 29 (09): : L1712 - L1715
- [2] OPTOGALVANIC MEASUREMENT OF NEGATIVE-IONS IN PLASMA BY SEMICONDUCTOR-LASERS [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1990, 29 (10): : L1915 - L1918
- [4] MULTICUSP TYPE ELECTRON-CYCLOTRON RESONANCE ION-SOURCE FOR PLASMA PROCESSING [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1991, 30 (02): : 376 - 384
- [9] RF DRIVEN MULTICUSP H-ION SOURCE [J]. REVIEW OF SCIENTIFIC INSTRUMENTS, 1991, 62 (01) : 100 - 104
- [10] SATO N, 1989, 1989 P INT C PLAS PH, P79