DETERMINATION OF THE EXCITATION MECHANISM FOR PHOTOFRAGMENT EMISSION IN THE ARF LASER PHOTOLYSIS OF NH3, N2H4, HNO3 AND CH3NH2

被引：30

作者：

KENNER, RD

ROHRER, F

STUHL, F

机构：

来源：

CHEMICAL PHYSICS LETTERS | 1985年 / 116卷 / 05期

关键词：

D O I：

10.1016/0009-2614(85)80187-1

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

页码：374 / 379

页数：6

共 25 条

[1] RADIATIVE LIFETIME OF METASTABLE NH(B-1-SIGMA+) [J].

BLUMENSTEIN, U ;

ROHRER, F ;

STUHL, F .

CHEMICAL PHYSICS LETTERS, 1984, 107 (03) :347-350

[2] 193 NM LASER DISSOCIATION OF CS2 - PROMPT EMISSION FROM CS AND INTERNAL ENERGY-DISTRIBUTION OF CS(X 1SIGMA+) [J].

BUTLER, JE ;

DROZDOSKI, WS ;

MCDONALD, JR .

CHEMICAL PHYSICS, 1980, 50 (03) :413-421

[3] ARF-LASER PHOTO-DISSOCIATION OF NH3 AT 193-NM - INTERNAL ENERGY-DISTRIBUTIONS IN NH2X2B1 AND A2A1, AND 2-PHOTON GENERATION OF NH-A3-PI AND B1-SIGMA+ [J].

DONNELLY, VM ;

BARONAVSKI, AP ;

MCDONALD, JR .

CHEMICAL PHYSICS, 1979, 43 (02) :271-281

[4]

Donovan R. J., 1981, GAS KINETICS ENERGY, V4, P117

[5] PHOTOFRAGMENT FLUORESCENCE FOLLOWING ULTRAVIOLET-LASER MULTIPLE-PHOTON EXCITATION OF CH3OH,CH3BR,CH3I MOLECULES [J].

FOTAKIS, C ;

MARTIN, M ;

LAWLEY, KP ;

DONOVAN, RJ .

CHEMICAL PHYSICS LETTERS, 1979, 67 (01) :1-4

[6]

GILLESPIE HM, 1980, ANN REP PROG CHEM C, V77, P173

[7] ARF (193 NM) LASER PHOTOLYSIS OF HN3, CH3NH2, AND N2H4 - FORMATION OF EXCITED NH RADICALS [J].

HAAK, HK ;

STUHL, F .

JOURNAL OF PHYSICAL CHEMISTRY, 1984, 88 (16) :3627-3633

[8] ARF EXCIMER LASER PHOTOLYSIS OF AMMONIA - FORMATION OF NH AND ND IN THE A3-PI STATE [J].

HAAK, HK ;

STUHL, F .

JOURNAL OF PHYSICAL CHEMISTRY, 1984, 88 (11) :2201-2204

[9]

HAAK HK, 1982, THESIS RUHR U BOCHUM

[10] MULTI-PHOTON SEQUENTIAL PHOTO-DISSOCIATIVE EXCITATION - A NEW METHOD OF REMOTE ATMOSPHERIC SENSING [J].

HALPERN, JB ;

JACKSON, WM ;

MCCRARY, V .

APPLIED OPTICS, 1979, 18 (05) :590-592

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