AN OVERVIEW OF HIGH-TEMPERATURE ELECTRONIC DEVICE TECHNOLOGIES AND POTENTIAL APPLICATIONS

被引:123
作者
DREIKE, PL [1 ]
FLEETWOOD, DM [1 ]
KING, DB [1 ]
SPRAUER, DC [1 ]
ZIPPERIAN, TE [1 ]
机构
[1] SANDIA NATL LABS,DIV RADIAT TECHNOL & ASSURANCE,ALBUQUERQUE,NM
来源
IEEE TRANSACTIONS ON COMPONENTS PACKAGING AND MANUFACTURING TECHNOLOGY PART A | 1994年 / 17卷 / 04期
关键词
D O I
10.1109/95.335047
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
High-temperature electronics applications are found in combustion systems, well logging, industrial processes, air stagnation points in supersonic aircraft, vehicle brakes, nuclear reactors, and dense electronic packages. We summarize physical effects and materials issues important for reliable operation of semiconductor device technologies at high temperatures (>(125)degrees C). We review the high-temperature potential of Si, GaAs, other III-V compounds, and SiC. For completeness, we also comment on nitrides, diamond, and vacuum microeleetronics. We conclude that Si on insulator (SOI) technology can be developd readily for small signal operation up to about 300 degrees C. There is some ongoing work in this area. GaAs offers little advantage over Si because of poor device isolation and the lack of reliable contacts above 250 degrees C. Other m-V compounds could be developed for operation to similar to 600 degrees C, using processes similar to those used for optoelectronics. There may be a market niche for III-V power devices above 200 degrees C. There is considerable activity in semiconducting SiC, and device functionality has been demonstrated above 600 degrees C. SiC is promising for operation above 300 degrees C, and for power devices at frequencies from dc to similar to 10 GHz, but it faces numerous challenges to achieve manufacturable status. We attempt to match technologies with application areas.
引用
收藏
页码:594 / 609
页数:16
相关论文
共 83 条
  • [1] ARIMOTO Y, 1992, IEICE T ELECTRON, VE75C, P1442
  • [2] ARTHUR SD, 1992, P IEEE IND APPLICATI, V1, P1144
  • [3] BALIGA BJ, 1992, SPRINGER P PHYSICS, V71, P305
  • [4] SIC BOULE GROWTH BY SUBLIMATION VAPOR TRANSPORT
    BARRETT, DL
    SEIDENSTICKER, RG
    GAIDA, W
    HOPKINS, RH
    CHOYKE, WJ
    [J]. JOURNAL OF CRYSTAL GROWTH, 1991, 109 (1-4) : 17 - 23
  • [5] ENERGY-DEPENDENCE OF ELECTRON DAMAGE AND DISPLACEMENT THRESHOLD ENERGY IN 6H SILICON-CARBIDE
    BARRY, AL
    LEHMANN, B
    FRITSCH, D
    BRAUNIG, D
    [J]. IEEE TRANSACTIONS ON NUCLEAR SCIENCE, 1991, 38 (06) : 1111 - 1115
  • [6] PROCESS CHARACTERISTICS AND DESIGN METHODS FOR A 300-DEGREES-C QUAD OPERATIONAL-AMPLIFIER
    BEASOM, JD
    PATTERSON, RB
    [J]. IEEE TRANSACTIONS ON INDUSTRIAL ELECTRONICS, 1982, 29 (02) : 112 - 117
  • [7] BELSKI GT, 1992, NOV INT TRUCK BUS M
  • [8] COMPARISON OF 6H-SIC, 3C-SIC, AND SI FOR POWER DEVICES
    BHATNAGAR, M
    BALIGA, BJ
    [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1993, 40 (03) : 645 - 655
  • [9] ELECTROMIGRATION - A BRIEF SURVEY AND SOME RECENT RESULTS
    BLACK, JR
    [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1969, ED16 (04) : 338 - &
  • [10] SILICON-CARBIDE UV PHOTODIODES
    BROWN, DM
    DOWNEY, ET
    GHEZZO, M
    KRETCHMER, JW
    SAIA, RJ
    LIU, YS
    EDMOND, JA
    GATI, G
    PIMBLEY, JM
    SCHNEIDER, WE
    [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1993, 40 (02) : 325 - 333