EVALUATION OF AUGER-ELECTRON SPECTROSCOPY (AES) DEPTH-PROFILES BY APPLICATION OF FACTOR-ANALYSIS

被引：4

作者：

OESTERSCHULZE, E ^{[1
]}

MASSELI, K ^{[1
]}

KASSING, R ^{[1
]}

机构：

[1] UNIV KASSEL,INST TECH PHYS,W-3500 KASSEL,GERMANY

来源：

FRESENIUS JOURNAL OF ANALYTICAL CHEMISTRY | 1991年 / 341卷 / 1-2期

关键词：

D O I：

10.1007/BF00322110

中图分类号：

O65 [分析化学];

学科分类号：

070302 ; 081704 ;

摘要：

AES is a useful tool in order to determine the quantitative composition of a solid surface. Conventional methods of evaluating AES concentration profiles leave chemical information about the bonding state of an element contained in the spectra unused. To extract these Factor Analysis (FA) was employed as a mathematical technique to form a physical model of the composition of a sample. With FA the correlation function between the measured spectra is evaluated. Thus it is possible to determine number and quantity of chemical components influencing the data. The feasibility of FA is demonstrated by its application to the evaluation of AES concentration profiles. We investigated in some detail heterostructures consisting of a Si3N4/alpha-Si:H/SiO2 and Ti/Si Schottky contacts on Si substrates, respectively.

引用

页码：70 / 73

页数：4

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