共 50 条
- [21] Stress evolution and notch formation during polysilicon gate electrode etchingTHIN-FILMS - STRESSES AND MECHANICAL PROPERTIES VII, 1998, 505 : 433 - 438Vyvoda, MAGraves, DB
- [22] ETCHING OF POLYSILICON GATES FOR VLSIJOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1986, 133 (08) : C312 - C312RAO, DBGLEASON, RE
- [23] LOW-PRESSURE ANISOTROPIC-PLASMA ETCHING OF DOPED POLYSILICON IN CCL4JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1982, 129 (03) : C105 - C105BERNACKI, SE
- [24] HYDROCARBON FORMATION OF POLYMER SUPPORTED COBALTABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1980, 180 (AUG): : 128 - INORPERKINS, PVOLLHARDT, KPC
- [25] ANISOTROPIC-PLASMA ETCHING OF POLYSILICON USING SF6 AND CFCL3JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1983, 1 (02): : 629 - 635MIETH, MBARKER, A
- [26] ANISOTROPIC-PLASMA ETCHING OF POLYSILICON WITH 100-1 SELECTIVITY OVER THERMAL OXIDEPROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS, 1984, 470 : 39 - 46RAO, DB
- [27] ANISOTROPIC ETCHING OF N(+)-POLYSILICON USING BEAM PLASMAS GENERATED BY GAS PUFF PLASMA SOURCESJAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1995, 34 (4B): : 2101 - 2106OOMORI, TTAKI, MNISHIKAWA, KOOTERA, HONO, K
- [28] A SPECTROSCOPIC INVESTIGATION OF ANISOTROPIC POLYSILICON ETCHING IN CL2/SF6 PLASMASJOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1984, 131 (08) : C309 - C309SPIERS, AISHARP, ACGUITE, DRCONGRAVE, J
- [29] Formation of porous Al particles by anisotropic anodic etchingELECTROCHEMISTRY COMMUNICATIONS, 2017, 78 : 26 - 28Yanagishita, TakashiImaizumi, MasahikoKondo, ToshiakiMasuda, Hideki
- [30] MICROTRENCH FORMATION IN POLYSILICON PLASMA-ETCHING OVER THIN GATE OXIDEJOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1993, 140 (08) : 2395 - 2401DALTON, TJARNOLD, JCSAWIN, HHSWAN, SCORLISS, D