XPS ANALYSIS OF SI AND SIO2 SURFACES EXPOSED TO CHF3 AND CHF3-C2F6 PLASMAS - POLYMERIZATION AND ETCHING

被引：48
作者：
CARDINAUD, C
RHOUNNA, A
TURBAN, G
GROLLEAU, B
机构：
来源：
REVUE DE PHYSIQUE APPLIQUEE | 1989年 / 24卷 / 03期
关键词：
D O I：
10.1051/rphysap:01989002403030900
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
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页码：309 / 321
页数：13
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