A SIMPLE METHOD FOR THE RAPID MEASUREMENT OF THE THICKNESS OF ULTRATHIN METAL-FILMS

被引：4
|
作者：
SHENG, YQ [1 ]
MUNZ, P [1 ]
SCHULTHEISS, R [1 ]
BUCHER, E [1 ]
机构：
[1] UNIV CONSTANCE,FAK PHYS,D-7750 CONSTANCE,FED REP GER
来源：
THIN SOLID FILMS | 1985年 / 131卷 / 1-2期
关键词：
GOLD AND ALLOYS - Thin Films - MICROSCOPIC EXAMINATION;
D O I：
10.1016/0040-6090(85)90382-7
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
A simple method for the rapid measurement of the thickness of ultrathin metal films in the range from a few angstroems to about 100 A was developed. The method is based on measurements of the intensity of electrons backscattered by the film; primary electron with energies of the order of 10 keV were used. A good thickness resolution of at least 0. 3 A was obtained for gold. If the focused electron beam of a scanning electron microscope is used, the method has an inherent lateral resolution of the order of 1 mu m. A number of films consisting of metals with atomic numbers Z greater than equivalent to 13 were successfully analyzed. The method is applicable to films of noble metals as well as to reactive materials such as aluminum, scandium and cerium.
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页码：131 / 138
页数：8
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