ROUGHNESS INDUCED AT SI(111) SURFACES BY HIGH-TEMPERATURE HEATING

被引：32
作者：
BORENSZTEIN, Y
LOPEZRIOS, T
VUYE, G
机构：
[1] Laboratoire d'Optique des Solides, UA CNRS 781, Université Pierre et Marie Curie, 75252 Paris Cédex 05
来源：
APPLIED SURFACE SCIENCE | 1989年 / 41-2卷
关键词：
D O I：
10.1016/0169-4332(89)90099-8
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
The roughness of Si(111) surfaces induced by heating at temperatures between 900 and 1000°C is studied by differential reflectivity measurements. For the lowest temperatures, the stepped-roughness of the surface is smoothed out by annealing the surface, leading to an increase of reflectivity for light energies below 3 eV. For the highest temperatures, a larger scale roughness (of the order of several tens of nm) is formed at the surface. This roughness increases with temperature and induces essentially a scattering of light leading to a decrease of reflectivity in the UV range. © 1989.
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页码：439 / 442
页数：4
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