THOMSON SCATTERING MEASUREMENTS OF ELECTRON-TEMPERATURE AND DENSITY IN AN ELECTRON-CYCLOTRON RESONANCE PLASMA

被引:72
作者
BOWDEN, MD
OKAMOTO, T
KIMURA, F
MUTA, H
UCHINO, K
MURAOKA, K
SAKODA, T
MAEDA, M
MANABE, Y
KITAGAWA, M
KIMURA, T
机构
[1] KITAKYUSHU NATL COLL TECHNOL,KITAKYUSHU,FUKUOKA 803,JAPAN
[2] KYUSHU UNIV,DEPT ELECT ENGN,FUKUOKA 812,JAPAN
[3] MATSUSHITA ELECT IND CO LTD,MORIGUCHI,OSAKA 570,JAPAN
关键词
D O I
10.1063/1.353046
中图分类号
O59 [应用物理学];
学科分类号
摘要
Electron temperature T(e) and density n(e) in the source region of an electron cyclotron resonance discharge have been measured by incoherent Thomson scattering of the beam from a 0.5 J yttrium aluminum garnet laser. This is the first experiment in which this technique, routinely used on fusion plasmas, has been applied to a processing plasma. Measurements were made in an argon discharge at pressures from 0.3 to 2 mTorr and microwave powers from 250 to 1000 W. Velocity distributions were measured both parallel and perpendicular to the magnetic field and a slight anisotropy of electron temperature was observed for low-pressure discharges. Temperatures in the range of 1-5 eV and densities in the range of 2-10 x 10(17) m-3 were measured. T(e) and n(e) were found to strongly depend on pressure but only weakly on the input power and discharge magnetic field. No deviations from a Maxwellian velocity distribution were observed.
引用
收藏
页码:2732 / 2738
页数:7
相关论文
共 19 条
[1]  
AMUNDSEN J, 1989, J VAC SCI TECHNOL A, V7, P833
[2]  
Desilva A.W., 1970, METHODS EXPT PHYS, V9
[3]   LASER LIGHT SCATTERING IN LABORATORY PLASMAS [J].
EVANS, DE ;
KATZENSTEIN, J .
REPORTS ON PROGRESS IN PHYSICS, 1969, 32 (02) :207-+
[4]   BEHAVIOR OF AR PLASMAS FORMED IN A MIRROR FIELD ELECTRON-CYCLOTRON RESONANCE MICROWAVE ION-SOURCE [J].
GORBATKIN, SM ;
BERRY, LA ;
ROBERTO, JB .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1990, 8 (03) :2893-2899
[5]  
Hershkowitz N., 1989, PLASMA DIAGNOSTICS, VI
[6]   PLASMA STRUCTURES IN AN ELECTRON-CYCLOTRON RESONANCE PLASMA PROCESSING DEVICE [J].
IIZUKA, S ;
SATO, N .
JOURNAL OF APPLIED PHYSICS, 1991, 70 (08) :4165-4171
[7]   LOW-TEMPERATURE CHEMICAL VAPOR-DEPOSITION METHOD UTILIZING AN ELECTRON-CYCLOTRON RESONANCE PLASMA [J].
MATSUO, S ;
KIUCHI, M .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1983, 22 (04) :L210-L212
[8]   ION AND NEUTRAL TEMPERATURES IN ELECTRON-CYCLOTRON RESONANCE PLASMA REACTORS [J].
NAKANO, T ;
SADEGHI, N ;
GOTTSCHO, RA .
APPLIED PHYSICS LETTERS, 1991, 58 (05) :458-460
[9]   ELECTRICAL AND OPTICAL MEASUREMENTS OF ELECTRON-CYCLOTRON RESONANCE DISCHARGES IN CL2 AND AR [J].
OOMORI, T ;
TUDA, M ;
OOTERA, H ;
ONO, K .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1991, 9 (03) :722-726
[10]   CHARACTERIZATION OF ELECTRON-CYCLOTRON RESONANCE HYDROGEN PLASMAS [J].
OUTTEN, CA ;
BARBOUR, JC ;
WAMPLER, WR .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1991, 9 (03) :717-721