共 19 条
[1]
AMUNDSEN J, 1989, J VAC SCI TECHNOL A, V7, P833
[2]
Desilva A.W., 1970, METHODS EXPT PHYS, V9
[4]
BEHAVIOR OF AR PLASMAS FORMED IN A MIRROR FIELD ELECTRON-CYCLOTRON RESONANCE MICROWAVE ION-SOURCE
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS,
1990, 8 (03)
:2893-2899
[5]
Hershkowitz N., 1989, PLASMA DIAGNOSTICS, VI
[7]
LOW-TEMPERATURE CHEMICAL VAPOR-DEPOSITION METHOD UTILIZING AN ELECTRON-CYCLOTRON RESONANCE PLASMA
[J].
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS,
1983, 22 (04)
:L210-L212
[9]
ELECTRICAL AND OPTICAL MEASUREMENTS OF ELECTRON-CYCLOTRON RESONANCE DISCHARGES IN CL2 AND AR
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS,
1991, 9 (03)
:722-726
[10]
CHARACTERIZATION OF ELECTRON-CYCLOTRON RESONANCE HYDROGEN PLASMAS
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS,
1991, 9 (03)
:717-721