EFFECTS OF MONOCHLOROSILANE ON THE PROPERTIES OF PLASMA DEPOSITED HYDROGENATED AMORPHOUS-SILICON

被引：5
|
作者：
DELAHOY, AE [1 ]
GRIFFITH, RW [1 ]
KAMPAS, FJ [1 ]
VANIER, PE [1 ]
机构：
[1] BROOKHAVEN NATL LAB,DIV MET & MAT SCI,UPTON,NY 11973
来源：
JOURNAL OF ELECTRONIC MATERIALS | 1982年 / 11卷 / 05期
关键词：
D O I：
10.1007/BF02658902
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
收藏
页码：869 / 882
页数：14
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