ANALYSIS OF OXYGEN ISOTOPE INTERFACES USING NEGATIVE MOLECULAR ION SIMS

被引:17
作者
MITCHELL, DF
HUSSEY, RJ
GRAHAM, MJ
机构
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1983年 / 1卷 / 02期
关键词
D O I
10.1116/1.572325
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
引用
收藏
页码:1006 / 1008
页数:3
相关论文
共 8 条
[1]   OXYGEN ISOTOPIC CONCENTRATION GRADIENT DETERMINATION WITH CAMECA ION MASS ANALYZER [J].
CONTAMIN, P ;
SLODZIAN, G .
APPLIED PHYSICS LETTERS, 1968, 13 (12) :416-&
[2]   DIFFUSION OF OXYGEN IN GROWING ZIRCONIA FILMS [J].
COX, B ;
PEMSLER, JP .
JOURNAL OF NUCLEAR MATERIALS, 1968, 28 (01) :73-&
[3]   INFLUENCE OF OXIDE STRUCTURE ON OXIDATION RATE OF NICKEL SINGLE-CRYSTALS [J].
GRAHAM, MJ ;
HUSSEY, RJ ;
COHEN, M .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1973, 120 (11) :1523-1529
[4]   DEPTH PROFILING BY SIMS DEPTH RESOLUTION, DYNAMIC-RANGE AND SENSITIVITY [J].
MAGEE, CW ;
HONIG, RE .
SURFACE AND INTERFACE ANALYSIS, 1982, 4 (02) :35-41
[5]  
MEYER M, 1978, J MICROSC SPECT ELEC, V3, P477
[6]  
RHINES FN, 1975, STRESS EFFECTS OXIDA, P94
[7]   USE OF SIMS TO INVESTIGATE INCORPORATION OF OXYGEN IN COO SCALES [J].
SHEASBY, JS ;
BROWN, JD .
OXIDATION OF METALS, 1978, 12 (05) :405-411
[8]   OXYGEN TRACER STUDIES OF THE OXIDATION OF NIOBIUM [J].
SHEASBY, JS ;
SMELTZER, WW .
OXIDATION OF METALS, 1981, 15 (3-4) :215-229