LOW-PRESSURE DEPOSITION OF PHOSPHOSILICATE GLASS-FILMS

被引：42

作者：

LEVIN, RM

ADAMS, AC

机构：

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1982年 / 129卷 / 07期

关键词：

D O I：

10.1149/1.2124213

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：1588 / 1592

页数：5

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