TEM OBSERVATION OF MICROSTRUCTURE IN SPUTTERED CO-CR FILM

被引：59
作者：
MAEDA, Y
HIRONO, S
ASAHI, M
机构：
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS | 1985年 / 24卷 / 12期
关键词：
D O I：
10.1143/JJAP.24.L951
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
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页码：L951 / L953
页数：3
相关论文
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[4]   PERPENDICULAR MAGNETIZATION STRUCTURE OF CO-CR FILMS [J].
OUCHI, K ;
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[5]   EVIDENCE FOR MICROSTRUCTURAL INHOMOGENEITY IN SPUTTERED CO-CR THIN-FILMS [J].
SMITS, JW ;
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[6]  
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