SURFACE CHEMICAL-SHIFTS AND PHOTOELECTRON DIFFRACTION IN COSI2

被引：40
作者：
LECKEY, R
RILEY, JD
JOHNSON, RL
LEY, L
DITCHEK, B
机构：
[1] MAX PLANCK INST FESTKORPERFORSCH,D-7000 STUTTGART 80,FED REP GER
[2] GTE LABS INC,WALTHAM,MA 02254
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1988年 / 6卷 / 01期
关键词：
D O I：
10.1116/1.574970
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
引用
收藏
页码：63 / 69
页数：7
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