DIFFRACTION EFFECTS ON PATTERN REPLICATION WITH SYNCHROTRON RADIATION

被引：18

作者：

ATODA, N

KAWAKATSU, H

TANINO, H

ICHIMURA, S

HIRATA, M

HOH, K

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1983年 / 1卷 / 04期

关键词：

D O I：

10.1116/1.582766

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：1267 / 1270

页数：4

共 7 条

[1]

ARITOME H, 1978, 8TH P INT C EL ION B, P468

[2] X-RAY REPLICATION OF MASKS USING SYNCHROTRON RADIATION PRODUCED BY ACO STORAGE RING [J].

FAY, B ;

TROTEL, J ;

PETROFF, Y ;

PINCHAUX, R ;

THIRY, P .

APPLIED PHYSICS LETTERS, 1976, 29 (06) :370-372

[3]

GROBMAN WD, 1980, TECH DIG INT ELECTRO, V415

[4] ION-BEAM EXPOSURE APPARATUS USING A LIQUID-METAL SOURCE [J].

KOMURO, M .

THIN SOLID FILMS, 1982, 92 (1-2) :155-164

[5] APPLICATION OF SYNCHROTRON RADIATION TO X-RAY LITHOGRAPHY [J].

SPILLER, E ;

EASTMAN, DE ;

FEDER, R ;

GROBMAN, WD ;

GUDAT, W ;

TOPALIAN, J .

JOURNAL OF APPLIED PHYSICS, 1976, 47 (12) :5450-5459

[6]

Tischer P., 1980, From Electronics to Microelectronics. Fourth European Conference on Electrotechnics-EUROCON'80, P46

[7]

TOMIMASU T, 1983, IEEE T NUCL SCI, V30

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