OXIDATION OF SI3N4 IN RANGE 1300DEGREESC TO 1500DEGREESC

被引:103
作者
TRIPP, WC
GRAHAM, HC
机构
[1] SYST RES LABS INC,DAYTON,OH 45440
[2] USAF,MAT LAB,DIV MET & CERAMICS,WRIGHT PATTERSON AFB,OH 45433
关键词
D O I
10.1111/j.1151-2916.1976.tb09505.x
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
引用
收藏
页码:399 / 403
页数:5
相关论文
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