CORRELATION OF QUANTITATIVE AUGER-ELECTRON SPECTROSCOPY WITH SECONDARY ION MASS SPECTROSCOPIC INVESTIGATIONS OF AL/SI/CU VLSI METALLIZATION

被引：1

作者：

STEVENS, HA

HANCE, RL

HONG, C

PYLE, RE

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1985年 / 3卷 / 03期

关键词：

D O I：

10.1116/1.573288

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：696 / 699

页数：4

共 6 条

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[2] PHASE SEGREGATION OF CU IN AL-CU THIN-FILMS
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[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1983, 1 (02): : 449 - 451
[3] COPPER DISTRIBUTION IN SPUTTERED AL-CU FILMS
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[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1980, 17 (06): : 1326 - 1331
[4] MATRIX CALIBRATION FOR THE QUANTITATIVE-ANALYSIS OF LAYERED SEMICONDUCTORS BY SECONDARY ION MASS-SPECTROMETRY
GALUSKA, AA
MORRISON, GH
[J]. ANALYTICAL CHEMISTRY, 1983, 55 (13) : 2051 - 2055
[5] HANCE RL, UNPUB
[6] HANSEN M, 1958, CONSTITUTION BINARY, P87