CHROMIUM SILICIDE FORMATION UNDER PULSED HEAT-FLOW

被引：13

作者：

DANNA, E ^{[1
]}

LEGGIERI, G ^{[1
]}

LUCHES, A ^{[1
]}

MAJNI, G ^{[1
]}

OTTAVIANI, G ^{[1
]}

机构：

[1] UNIV MODENA,DEPARTIMENTO FIS,I-41100 MODENA,ITALY

来源：

THIN SOLID FILMS | 1986年 / 136卷 / 01期

关键词：

The authors warmly thank F. De Donno and V. Nicolardi for qualified technical assistance. This work was supported by the Ministero della Pubblica Istruzione;

D O I：

10.1016/0040-6090(86)90112-4

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：93 / 104

页数：12

共 17 条

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[2] CARSLAW HS, 1959, CONDUCTION HEAT SOLI
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[8] A CROSS-SECTIONAL TRANSMISSION ELECTRON-MICROSCOPY STUDY OF SILICIDE GROWTH-KINETICS IN THE CR/(100)SI SYSTEM AT 425-DEGREES-C
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[10] CRYSTAL-GROWTH AND THERMOELECTRIC PROPERTIES OF CHROMIUM DISILICIDE
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