FOURIER-ANALYSIS OF INTERFERENCE STRUCTURE IN X-RAY SPECULAR REFLECTION FROM THIN-FILMS

被引：39

作者：

SAKURAI, K ^{[1
]}

IIDA, A ^{[1
]}

机构：

[1] NATL LAB HIGH ENERGY PHYS,PHOTON FACTORY,TSUKUBA,IBARAKI 305,JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 1992年 / 31卷 / 2A期

关键词：

X-RAY TOTAL REFLECTION; INTERFERENCE OSCILLATION; MULTILAYERED THIN FILMS; FOURIER ANALYSIS; X-RAY REFLECTIVITY; GRAZING INCIDENCE; FILM THICKNESS DETERMINATION; SYNCHROTRON RADIATION; SIO2; THICKNESS;

D O I：

10.1143/JJAP.31.L113

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Interference oscillation observed in X-ray total external reflection from thin films was analyzed by the Fourier transform algorithm. The peak position in Fourier space was in good agreement with the layer thickness, and was determined independently from the surface/interface roughness. The principle of the present technique and its application to SiO2/Si thin films are shown. The advantages of the experiments using tunable synchrotron X-rays are also discussed.

引用

页码：L113 / L115

页数：3

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