PREPARATION OF PYRITE FILMS BY PLASMA-ASSISTED SULFURIZATION OF THIN IRON FILMS

被引:58
|
作者
BAUSCH, S [1 ]
SAILER, B [1 ]
KEPPNER, H [1 ]
WILLEKE, G [1 ]
BUCHER, E [1 ]
FROMMEYER, G [1 ]
机构
[1] MAX PLANCK INST IRON RES,W-4000 DUSSELDORF,GERMANY
关键词
D O I
10.1063/1.104233
中图分类号
O59 [应用物理学];
学科分类号
摘要
Pyrite films were prepared using the pure elements as source materials: thin iron films were evaporated on quartz substrates and exposed to a sulfur plasma. The process was controlled by a transmission measurement. X-ray spectroscopy was used to characterize the films and preliminary optical and electrical measurements were carried out.
引用
收藏
页码:25 / 27
页数:3
相关论文
共 50 条
  • [1] THIN PYRITE FILMS PREPARED BY SULFURIZATION OF ELECTRODEPOSITED IRON FILMS
    PIMENTA, G
    SCHRODER, V
    KAUTEK, W
    BERICHTE DER BUNSEN-GESELLSCHAFT-PHYSICAL CHEMISTRY CHEMICAL PHYSICS, 1991, 95 (11): : 1470 - 1475
  • [2] Synthesis of iron pyrite thin films by Russian Doll sulfurization apparatus
    Silva, M. F. O.
    Souza, L. P.
    de Oliveira, S.
    Ferlauto, A. S.
    Rodrigues, W. N.
    THIN SOLID FILMS, 2016, 616 : 303 - 310
  • [3] PLASMA-ASSISTED CVD OF THIN POLYSILICON FILMS
    BURGER, WR
    DONAHUE, TJ
    REIF, R
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1982, 129 (08) : C325 - C325
  • [4] Fabrication of Iron Pyrite Thin Films and Photovoltaic Devices by Sulfurization in Electrodeposition Method
    Lu, Zheng
    Zhou, Hu
    Ye, Chao
    Chen, Shi
    Ning, Jinyan
    Halim, Mohammad Abdul
    Donaev, Sardor Burkhanovich
    Wang, Shenghao
    NANOMATERIALS, 2021, 11 (11)
  • [5] Plasma-assisted deposition of iron oxide thin films for photoelectrochemical water splitting
    Bosso, Piera
    Milella, Antonella
    Barucca, Gianni
    Mengucci, Paolo
    Armenise, Vincenza
    Fanelli, Fiorenza
    Giannuzzi, Roberto
    Maiorano, Vincenzo
    Fracassi, Francesco
    PLASMA PROCESSES AND POLYMERS, 2021, 18 (01)
  • [6] Plasma-assisted MOCVD growth of ZnO thin films
    Losurdo, Maria
    Giangregorio, Maria M.
    Capezzuto, Pio
    Bruno, Giovanni
    Malandrino, Graziella
    Blandino, Manuela
    Fragala, Ignazio L.
    GAN, AIN, INN AND RELATED MATERIALS, 2006, 892 : 445 - +
  • [7] Plasma-assisted MOCVD growth of ZnO thin films
    Losurdo, Maria
    Giangregorio, Maria M.
    Capezzuto, Pio
    Bruno, Giovanni
    Malandrino, Graziella
    Blandino, Manuela
    Fragala, Ignazio L.
    PROGRESS IN SEMICONDUCTOR MATERIALS V-NOVEL MATERIALS AND ELECTRONIC AND OPTOELECTRONIC APPLICATIONS, 2006, 891 : 387 - +
  • [8] PLASMA-ASSISTED DEPOSITION OF GAAS THIN-FILMS
    TAKENAKA, K
    HARIU, T
    SHIBATA, Y
    JAPANESE JOURNAL OF APPLIED PHYSICS, 1980, 19 : 183 - 186
  • [9] Plasma-assisted electrospray deposition of thin elastomer films
    Hashimoto, Kohei
    Takehara, Hiroaki
    Ichiki, Takanori
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2019, 58
  • [10] Gallium nitride thin films by microwave plasma-assisted ALD
    Romo-Garcia, F.
    Higuera-Valenzuela, H. J.
    Cabrera-German, D.
    Berman-Mendoza, D.
    Ramos-Carrazco, A.
    Contreras, O. E.
    Garcia-Gutierrez, R.
    OPTICAL MATERIALS EXPRESS, 2019, 9 (11) : 4187 - 4193