LATTICE VACANCIES IN TIN AND HFN FILMS - A STUDY BY POSITRON-ANNIHILATION

被引：30

作者：

BRUNNER, J ^{[1
]}

PERRY, AJ ^{[1
]}

机构：

[1] GTE VALENITE CORP,TROY,MI 48084

来源：

THIN SOLID FILMS | 1987年 / 153卷

关键词：

D O I：

10.1016/0040-6090(87)90174-X

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：103 / 113

页数：11

共 37 条

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[6]

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[9] MICROSTRUCTURE AND HARDNESS OF TI(C,N) COATINGS ON STEEL PREPARED BY THE ACTIVATED REACTIVE EVAPORATION TECHNIQUE [J].

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[10] REACTIVELY MAGNETRON SPUTTERED HF-N FILMS .1. COMPOSITION AND STRUCTURE [J].

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JOURNAL OF APPLIED PHYSICS, 1985, 58 (08) :3104-3111

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