HOLOGRAPHIC PHOTOELASTICITY BY USING DUAL-HOLOGRAM METHOD

被引：2

作者：

UOZATO, H ^{[1
]}

NAGATA, R ^{[1
]}

机构：

[1] UNIV OSAKA PREFECTURE,COLL ENGN,DEPT MECH ENGN,SAKAI,OSAKA 591,JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS | 1977年 / 16卷 / 01期

关键词：

D O I：

10.1143/JJAP.16.95

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：95 / 100

页数：6

共 11 条

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[3]

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[7] ADVANCEMENTS IN HOLOGRAPHIC PHOTOELASTICITY [J].

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[8]

NISIDA M, 1964, EXP MECH, V4, P366

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