PLASMA SPUTTER NEGATIVE-ION SOURCE WITH ECR DISCHARGE

被引：5
作者：
TAKAGI, A
IKEGAMI, K
MORI, Y
机构：
[1] National Laboratory for High-Energy Physics (KEK), Tsukuba-shi, Ibaraki-ken 305
来源：
REVIEW OF SCIENTIFIC INSTRUMENTS | 1992年 / 63卷 / 04期
关键词：
D O I：
10.1063/1.1142871
中图分类号：
TH7 [仪器、仪表];
学科分类号：
0804 ; 080401 ; 081102 ;
摘要：
A plasma sputter type of negative ion source with an electron cyclotron resonance (ECR) discharge has been developed at KEK. The ECR discharge was produced by a 2.45-GHz microwave. In this ion source, negative heavy ions are produced at the surface of the metal which is placed in a Xe plasma confined by a cusp magnetic field. In preliminary experiments, the beam current of 7 mA for Cu- was obtained in pulsed mode operation.
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页码：2669 / 2671
页数：3
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