PHOTOEMISSION-STUDY OF THE DEVELOPMENT OF THE TI/GAAS(110) INTERFACE

被引：32
作者：
RUCKMAN, MW
DELGIUDICE, M
JOYCE, JJ
WEAVER, JH
机构：
来源：
PHYSICAL REVIEW B | 1986年 / 33卷 / 04期
关键词：
D O I：
10.1103/PhysRevB.33.2191
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：2191 / 2197
页数：7
相关论文
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