ELECTRON-BEAM PROXIMITY PRINTING - A NEW HIGH-SPEED LITHOGRAPHY METHOD FOR SUB-MICRON STRUCTURES

被引：21
作者：
BOHLEN, H
GRESCHNER, J
KEYSER, J
KULCKE, W
NEHMIZ, P
机构：
来源：
IBM JOURNAL OF RESEARCH AND DEVELOPMENT | 1982年 / 26卷 / 05期
关键词：
D O I：
10.1147/rd.265.0568
中图分类号：
TP3 [计算技术、计算机技术];
学科分类号：
0812 ;
摘要：
引用
收藏
页码：568 / 579
页数：12
相关论文
共 14 条
[1]   X-RAY-LITHOGRAPHY MASK TECHNOLOGY [J].
BUCKLEY, WD ;
NESTER, JF ;
WINDISCHMANN, H .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1981, 128 (05) :1116-1120
[2]  
CHANG THP, 1977, ELECTRONICS, V50, P89
[3]  
CSEPREGI L, 1979, 15TH P S EL ION PHOT, P1962
[4]  
GRESCHNER J, 1980, 9TH P S EL ION BEAM, P152
[5]  
HATZAKIS M, 1981, SOLID STATE TECHNOL, V24, P74
[6]   VOLTAGE DEPENDENCE OF PROXIMITY EFFECTS IN ELECTRON-BEAM LITHOGRAPHY [J].
KYSER, DF ;
TING, CH .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (06) :1759-1763
[7]   ELECTRON OPTICS OF AN ELECTRON-BEAM LITHOGRAPHIC SYSTEM [J].
MAUER, JL ;
PFEIFFER, HC ;
STICKEL, W .
IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1977, 21 (06) :514-521
[8]  
MOORE R, 1981, ELECTRONICS, V54, P138
[9]   EL-3 - A HIGH THROUGHPUT, HIGH-RESOLUTION E-BEAM LITHOGRAPHY TOOL [J].
MOORE, RD ;
CACCOMA, GA ;
PFEIFFER, HC ;
WEBER, EV ;
WOODARD, OC .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (04) :950-952
[10]  
MOORE RD, 1977, P INT C MICROLITHOGR, P153
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